TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

Huawei has confirmed in a posting on its website reports about its breakthrough in making a light source component used in EUV lithography systems which are required for making high-end processors on ...

TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...

MUNICH, Germany — Suss MicroTec Test Systems GmbH today announced it has extended the use of low-cost 1:1 full-field lithography tools to sub-micron production steps using a breakthrough mask ...

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...

ACM Research, Inc. previously announced the delivery of its first Ultra Lith BK lithography system to a leading global display panel manufacturer, featuring ultraviolet curing uniformity of ±5% and ...

Rising lithography costs, shrinking feature sizes, and the need for an alternative to copper are collectively spurring new interest in area-selective deposition. An extension of atomic layer ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

At the forefront of Europe’s photonics innovation, TNO is building a state-of-the-art pilot line for Indium Phosphide (InP) photonic chips at the High Tech Campus in Eindhoven. As part of the ...