OBERKOCHEN, Germany — Carl Zeiss SMT AG, a supplier of illumination and projection optics for photolithography equipment, said Monday (July 14, 2003) that it has produced a commercial illumination ...

LONDON — Carl Zeiss SMT said Wednesday (Dec. 7) that it has shipped the first optical system for an extreme ultra violet (EUV) lithography tool to ASML Holding NV. ASML (Veldhoven, The Netherlands) is ...

There is a new type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below. Professor Tsumoru Shintake ...

German company will lead a new effort to shrink extreme ultraviolet (EUV) lithography resolution from 20 nm to 14 nm. The optics giant Carl Zeiss is to lead a new project to improve the resolution of ...

Intel has made significant strides in implementing High-NA EUV lithography by installing two High-NA litho machines, developing custom reticles as well as all-new optical proximity correction, and ...

In AI chips, it may be time to regard nothing, no matter what, as surprising. Driven by quenchless global demand, the advanced chip sector is changing, morphing and growing at a pace rarely seen in ...

New type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below Okinawa Institute of Science and ...