The semiconductor lithography equipment giant ASML has raised its growth expectations for the coming years, with progress in extreme ultraviolet (EUV) technology central to its plans. In 2025, the ...

Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...

ASML provided Intel, its first customer, with the $380 million Twinscan EXE:5000 High-NA lithography machine. Yesterday, it shipped its second High-NA EUV lithography machine to a mystery customer.

Two weeks ago, the Invent consortium at Albany Nanotech said it would receive the first alpha-class extreme-ultraviolet tool from equipment giant ASML (Veldhoven, the Netherlands). The second one is ...

ASML remains optimistic about the outlook for its extreme ultraviolet (EUV) lithography systems, including the next-generation High Numerical Aperture (High NA) EUV tools, as semiconductor customers ...

TSMC Senior VP Kevin Zhang spoke at a conference in Amsterdam this week, where he said TSMC's new A16 plants could be designed to accommodate the technology, but it's not certain... remember, TSMC is ...

Applied Materials announced a new chip fab machine that complements ASML's EUV lithography equipment. Applied's work could reduce the need for EUV in some instances. Rather than detract from ASML, ...